材料科学
电致变色
薄膜
制作
多孔性
电致变色装置
纳米技术
复合材料
电极
医学
病理
物理化学
化学
替代医学
作者
Jyothi Gupta,Habibuddin Shaik,Kiran Kumar,Sheik Abdul Sattar
标识
DOI:10.1016/j.mssp.2022.106534
摘要
Over the last decade thin film technology has made its root strong in the field of science and technology. Various applications demand refinement of different properties associated with thin film. One of the very susceptible properties associated with thin film of different materials to place it in various applications, is porosity. Porosity which accounts for volume of the void spaces over the entire volume of the thin film, is supporting in enhancing and refining many technological applications associated with thin film. Electrochromism is one such field in which porosity of thin film plays a major role. Tungsten oxide (WO3) is one of the versatile and frequently used electrochromic material which is majorly used in electrochromic device applications. Porous WO3 film can offer substantial upgradation in many applications specially in electrochromic device. In this view it becomes essential to find different means by which we can optimize the porosity of WO3 thin films under various deposition techniques. In this article we have tried to confine the various Physical Vapor Deposition techniques (PVD) for optimizing the porosity of WO3 thin films. Moreover, we have also tried to figure out the impact of various process parameters under different PVD techniques towards tailoring of porosity of WO3 thin films. Finally, we end up by listing few applications which are constantly at the verge of refinement by incorporating porous WO3 thin films with technological upswing.
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