Nitridation of Metalorganic-Chemical-VaporDeposited Al<SUB>2</SUB>O<SUB>3</SUB> Gate Dielectrics by NH<SUB>3</SUB> Annealing
材料科学
电介质
光电子学
作者
Gang He,X. F. Chen,J. W. Zhang,Min Zhang,Xiaohong Chen,Z. Q. Sun,Maosong Liu,Jinpeng Lv,Jie Cui