材料科学
带隙基准
压力(语言学)
降级(电信)
电压
光电子学
温度测量
电气工程
电子工程
硅
结温
失效机理
静电放电
核工程
压力测试(软件)
加速寿命试验
复合材料
不稳定性
蠕动
硅带隙温度传感器
使用寿命
造型(装饰)
法律工程学
宽禁带半导体
电流(流体)
工作温度
故障率
加速老化
机械
工作(物理)
碳化硅
高压
作者
IEEE International Symposium on Reliability Physics 2026,Sonia Ben-Dhia,Edinso Marina,René Theodora Hubertus Rongen,P. Tounsi,Pierre Turpin
摘要
Microelectronics product failure mechanisms (Hot Carrier Injection (HCI), Bias Temperature Instability (BTI) and package degradation) contributing to long-term drift in a Bandgap Voltage Reference are analyzed under High Temperature Operating Life (HTOL) and Low Temperature Operating Life (LTOL) tests and aging simulations. Results revealed that silicon degradation mechanisms (BTI and HCI) have minor impact, while degraded package-induced mechanical stress from molding compound oxidation dominates drift behavior, confirming prior findings.
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