Technology Study of Cu Underlayer Prepared by Magnetron-sputtering

Cu thin films are prepared by RF magnetron sputtering on glass substrate, and the texture of Cu thin films is changed by adjusting its sputtering parameters. It is found that when the temperature of the substrate is between 100℃ and 150℃,the thickness of the films is about 405nm and the sputtering power is between 150W and 300W, I(111)/I(200)of Cu thin films exceeds 15. The prepared Cu thin films appear good (111) preferential orientation growth. It will be a good underlayer of SmCo5 perpendicular thin films.