硅
材料科学
涂层
图层(电子)
多孔硅
等离子体
纳米晶硅
单晶硅
化学工程
复合材料
非晶硅
晶体硅
冶金
量子力学
物理
工程类
作者
Qi Zhang,Xueqin Zhang,Zhuang Ma,Ling Liu,Yanbo Liu
标识
DOI:10.1016/j.matchemphys.2022.125762
摘要
The quality of plasma sprayed silicon coating determined by density and spreading condition of lamella greatly influences its performance. The oxidation of silicon coating deteriorates its performance. However, the investigators mostly focus on the oxidation and mechanism of amorphous silicon, porous silicon and specific crystal planes on single crystal. The factors which influence the quality and oxidation of silicon coating has never be studied. The helium secondary gas flow has more influence on the quality of silicon coating than other spraying parameters. So, we prepare the silicon coating by plasma spraying technology with different secondary gas flow. The relationship between silicon coating's quality and secondary gas flow is investigated. Furthermore, the oxidation of plasma sprayed silicon coating is discussed. We find that the secondary gas has an adverse effect on quality and oxidation degree of silicon coating. With the decrease of secondary gas flow, both quality and oxygen content of coatings increase. Besides, the oxygen atoms heterogeneously concentrate at the outermost layer of silicon lamellas. Components of oxygen enrichment area (OEA) from outside to inside are Si + SiOx + SiO2→Si + Si2O + SiO2→Si + SiOx→Si (1
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