薄膜晶体管
材料科学
非晶硅
光电子学
晶体管
硅
无定形固体
准分子激光器
氧化物薄膜晶体管
电极
电气工程
激光器
纳米技术
图层(电子)
电压
光学
晶体硅
结晶学
化学
工程类
物理
物理化学
作者
Chang‐Dong Kim,M. Matsumura
摘要
Amorphous-silicon thin film transistors (TFTs) with submicrometer-long bottom-gate have been fabricated and their characteristics were evaluated. By the desirable effects of highly conductive source and drain of excimer-laser crystallized Si film, the mobility was hardly decreased from about 1.0 cm/sup 2//Vs for the 15-/spl mu/m long TFT to about 0.9 cm/sup 2//Vs for the 0.5-/spl mu/m long TFT. Detailed effects of the gate electrode thickness and length have been discussed on the TFT characteristics.
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