材料科学
外延
薄膜
金红石
亚稳态
结晶学
X射线晶体学
脉冲激光沉积
分析化学(期刊)
纳米技术
衍射
光学
图层(电子)
物理
化学
有机化学
量子力学
色谱法
作者
Franklin J. Wong,Shriram Ramanathan
摘要
We exploit epitaxial relationships of rutile-type VO2 with (0001) Al2O3, (111) LaAlO3, (10‾10) Al2O3, and (10‾12) Al2O3 to achieve high-quality VO2 thin-film synthesis. We show that the deposition temperature can be lowered when these substrates are employed compared to one with no preferred crystallographic relationship with VO2, such as Si. We also report the first thin-film synthesis of the metastable VO2(B) polymorph on (001) LaAlO3 with a strongly preferred (001) out-of-plane orientation. These results are of interest for integrating VO2 films with other oxides in optoelectronic and reconfigurable device structures.
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