极紫外光刻
光学
自适应光学
平版印刷术
光学成像
计算机科学
图像分辨率
极端紫外线
分辨率(逻辑)
计量学
物理
人工智能
激光器
作者
Jens Timo Neumann,Matthias Rösch,Paul Gräupner,Sascha Migura,Bernhard Kneer,Winfried Kaiser,Koen van Ingen Schenau
摘要
New design solutions are available for high-NA EUV optics, maintaining simultaneously superior imaging performance and productivity below 9nm resolution by means of anamorphic imaging. We investigate the imaging properties of these new optics configurations by rigorous simulations, taking into account mask induced effects as well as characteristics of the new optics. We compare the imaging behavior to other, more traditional optics configurations, and show that the productivity gain of our new configurations is indeed obtained at excellent imaging performance.
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