High Responsivity Phototransistors Based on Few‐Layer ReS2 for Weak Signal Detection

响应度 光电子学 光电导性 材料科学 单层 光电探测器 图层(电子) 偏压 吸收(声学) 暗电流 电压 纳米技术 物理 量子力学 复合材料
作者
Erfu Liu,Mingsheng Long,Junwen Zeng,Wei Luo,Yaojia Wang,Yiming Pan,Wei Zhou,Baigeng Wang,Weida Hu,Zhenhua Ni,Yu‐Meng You,Xueao Zhang,Shiqiao Qin,Yi Shi,Kenji Watanabe,Takashi Taniguchi,Hongtao Yuan,Harold Y. Hwang,Yi Cui,Feng Miao
出处
期刊:Advanced Functional Materials [Wiley]
卷期号:26 (12): 1938-1944 被引量:317
标识
DOI:10.1002/adfm.201504408
摘要

2D transition metal dichalcogenides are emerging with tremendous potential in many optoelectronic applications due to their strong light–matter interactions. To fully explore their potential in photoconductive detectors, high responsivity is required. Here, high responsivity phototransistors based on few‐layer rhenium disulfide (ReS 2 ) are presented. Depending on the back gate voltage, source drain bias and incident optical light intensity, the maximum attainable photoresponsivity can reach as high as 88 600 A W −1 , which is a record value compared to other individual 2D materials with similar device structures and two orders of magnitude higher than that of monolayer MoS 2 . Such high photoresponsivity is attributed to the increased light absorption as well as the gain enhancement due to the existence of trap states in the few‐layer ReS 2 flakes. It further enables the detection of weak signals, as successfully demonstrated with weak light sources including a lighter and limited fluorescent lighting. Our studies underscore ReS 2 as a promising material for future sensitive optoelectronic applications.
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