Research Progress on Silicon Oxynitride Films

Silicon oxynitride films have broad important applications in the areas of microelectonics and optics for their excellent thermodynamical,dielectric and optical properties.They can be fabricated through the methods of CVD,sputtering,oxynitridation and ion implantation.The research progresses and applications of silicon oxynitride films are reviewed.The research trends on fabrication and applications of silicon oxynitride films are given.