透射电子显微镜
成核
之字形的
化学气相沉积
材料科学
扫描电子显微镜
结晶学
化学物理
纳米技术
岛屿生长
动力学
石墨烯
图层(电子)
化学
外延
几何学
复合材料
物理
量子力学
数学
有机化学
作者
Dancheng Zhu,Haibo Shu,Feng Jiang,Danhui Lv,Vijayshankar Asokan,Omar Omar,Jun Tang Yuan,Ze Zhang,Chuanhong Jin
标识
DOI:10.1038/s41699-017-0010-x
摘要
Abstract Understanding the microscopic mechanism is fundamental for function-oriented controlled chemical vapor deposition growth of two-dimensional (2D) materials. In this work, we reveal the growth kinetics of 2D MoS2 by capturing the nucleation seeds, evolving morphology, edge structure, and edge terminations at the atomic scale during chemical vapor deposition growth using the transmission electron microscopy and scanning transmission electron microscopy. The direct growth of few-layer and mono-layer MoS2 onto graphene-based transmission electron microscopy grids helped us to perform the subsequent transmission electron microscopy characterization without any solution-based transfer. Two seeding centers are observed: (i) Mo-oxysulfide (MoO x S2−y ) nanoparticles either in multi-shelled fullerene-like structures or as compact nanocrystals for the growth of fewer-layer MoS2; (ii) Mo-S atomic clusters. In the early stage growth, irregular polygons with two primary edge terminations, S-Mo Klein edges and Mo zigzag edges, appear approximately in equal numbers. The morphology evolves into a near-triangle shape in which Mo zigzag edges predominate. Results from density-functional theory calculations are consistent with the inferred growth kinetics, and thus support the growth mechanism we proposed. In general, the growth mechanisms found here should also be applicable in other 2D materials, such as MoSe2, WS2 and WSe2.
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