Aftereffect of heat shock on activity of the photosynthetic apparatus and lipid peroxidation in wheat leaves

The dynamics of development of oxidative stress and poststress recovery of the photosynthetic apparatus in leaves of 10-day-old wheat seedlings subjected to heat shock (40, 42, and 44°C) for 20 min and exposed to light for 72 h are studied. The effect of pretreatment temperature and light intensity on recovery of the photosynthetic apparatus and its resistance to photostress and repeated heat shock is examined.