Photochemical study of metal infiltrated e-beam resist using vapor-phase infiltration for EUV applications

Significant efforts have been dedicated to the development of inorganic-organic hybrid materials for next-generation EUV resists. Among the various synthesis, vapor-phase infiltration of metal source into existing e-beam photoresists using ALD process has drawn great attention. In this work, we have demonstrated the vapor-phase infiltration of both Hf and Al precursors into PMMA and HSQ resists, respectively. For example, under the electron exposure with 100 eV, both hybrid resists show relatively higher EUV absorption, increasing positive and negative tone. The detailed photochemical reactions of on electron exposure were investigated using an in-situ FTIR equipped with electron gun capability.