富勒烯
化学
接口(物质)
铜
无机化学
分子
有机化学
吉布斯等温线
作者
Xiao-Wan Xiong,Xinyue Wu,Yuansheng Cheng,Delei Yu,Xudong Xu,Yuwen Cheng,Fang‐Hui Wu,Xianwen Wei
摘要
By utilizing the unique electronic buffering capacity of C 60 , a significant number of Cu 0 /Cu + sites are created at the C 60 /Cu(OH)F interface, leading to a remarkable faradaic efficiency of C 2+ products up to 76.9% and exceptional stability.
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