Substrate Temperature Dependence of the Properties of ZnO∶Al Thin Films Prepared by Mid-frequency Sputtering

The performances of ZnO∶Al(ZAO) thin films are related to the substrate temperature during sputtering.The influence of substrate temperature on the performances of ZnO∶Al thin films prepared by mid-frequency magnetron sputtering were studied using a Zn target with 2 wt% Al.The ZAO film suitable for thin film solar cells were obtained,whose thickness,resistivity,carrier concentration and Hall mobility are 700?nm,4.6×10~(-4)?Ω\5cm,1.98×10~(20)?cm~(-3) and 61.9?cm~2/(V·s) respectively.The average optical transmittance is over 85% within visible light(400～800?nm).