作者
H. L. Hao,M. Y. Su,Haitao Wu,Hangyue Mei,Ruxian Yao,Feilong Liu,Hao Wen,S. X. Sun,R. X. Yao,School of Information Engineering, Huanghuai University, Zhumadian 463000, China,F. Liu,School of Information Engineering, Huanghuai University, Zhumadian 463000, China,H. Wen,School of Information Engineering, Huanghuai University, Zhumadian 463000, China,S. X. Sun,School of Information Engineering, Huanghuai University, Zhumadian 463000, China
摘要
The double InGaAs/InAs channel structure is designed to improve DC and RF characteristics of InP-based HEMT, which is studied by the numerical simulation. The saturated channel current, transconductance, subthreshold slope, drain induced barrier lowering, and frequency characteristics are analyzed. A comparison is done between the device with the double InGaAs/InAs channel and InGaAs channel. By using double InGaAs/InAs channel, maximum transconductance of 1019.7 mS/mm is achieved, and the lower value of subthreshold slope and drain induced barrier lowering is also obtained. The excellent performance of device with double InGaAs/InAs channel structure is mainly due to the enhanced confinement of the electrons in the channel region. In addition, the maximum oscillation frequency of 758.7 GHz is obtained with the double InGaAs/InAs channel structure.These results indicate that InP-based HEMT with double InGaAs/InAs channel structure is a promising candidate for high frequency application.