纳米团簇
材料科学
分子动力学
硅
化学物理
动力学(音乐)
熔化温度
纳米技术
计算化学
复合材料
冶金
物理
声学
化学
作者
Kuan-Chuan Fang,Cheng‐I Weng
出处
期刊:Nanotechnology
[IOP Publishing]
日期:2005-01-14
卷期号:16 (2): 250-256
被引量:32
标识
DOI:10.1088/0957-4484/16/2/012
摘要
Using the Stillinger-Weber (SW) potential model, we have performed molecular dynamics (MD) simulations to investigate the melting of silicon nanoclusters comprising a maximum of 9041 atoms. This study investigates the size, surface energy and root mean square displacement (RMSD) characteristics of the silicon nanoclusters as they undergo a heating process. The numerical results reveal that an intermediate nanocrystal regime exists for clusters with more than 357 atoms. Within this regime, a linear relationship exists between the cluster size and its melting temperature. It is found that melting of the silicon nanoclusters commences at the surface and that T(m,N) = T(m,Bulk)-αN(-1/3). Therefore, the extrapolated melting temperature of the bulk with a surface decreases from T(m,Bulk) = 1821 K to a value of T(m,357) = 1380 K at the lower limit of the intermediate nanocrystal regime.
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