On the Codepositon of Silicon and Boron (II) The Influence of Traces of Water Vapour on the Codepostion of Silicon and Boron

Abstract It has been proved experimentally that at the codeposition of silicoan and boron at low concentrations of boron, being comparable with the residual water vapour of the gases, gaseous phase reactions ake place, decreasing the incorporation of boron in the deposited silicon. Probably silioxy‐boron‐halides are formed in these reactions.