Post-CMOS micromachined RF varactor with mutual-isolated large-tuning capacitor and low-voltage actuator
作者
Lei Gu,Xia Li
出处
期刊:Electronics Letters [Institution of Engineering and Technology] 日期:2007-07-17卷期号:43 (15): 808-809被引量:1
标识
DOI:10.1049/el:20071423
摘要
A micromachined tunable capacitor is presented, with the variable capacitor electrically isolated from the electrostatic actuator for flexible circuit application. Fabricated in low-resisitivity silicon wafer with CMOS-compatible processes, the device exhibits a large tuning range of 218% under 4 V driving, as well as a high Q-factor of 115 at 1 GHz and a high self-resonance frequency of 9.5 GHz.