分压
非阻塞I/O
分析化学(期刊)
电阻率和电导率
离子电导率
电导率
大气温度范围
掺杂剂
活化能
材料科学
氧气
固溶体
兴奋剂
化学
热力学
电极
物理化学
冶金
电解质
电气工程
物理
工程类
生物化学
催化作用
有机化学
光电子学
色谱法
作者
Eun Kyung Cho,Won Yang Chung,Keu Hong Kim,Kyung Moon Choi,Jae Shi Choi
标识
DOI:10.1111/j.1151-2916.1990.tb06478.x
摘要
NiO‐doped Tm 2 O 3 systems (NDT) containing 1, 3, and 5 mol% NiO were found to be solid solutions by X‐ray diffraction (XRD) analysis. The lattice parameters ( a ) were obtained by the Nelson‐Riley method, and the values decreased with increasing dopant content. Thermal analysis showed that no phase transition occurred in the temperature range covered in this experiment. The electrical conductivities were measured in the range of temperatures from 400° to 1100°C and of oxygen partial pressures from 1 × 10 −5 to 2 × 10 −1 atm. The conductivity increases with temperature but there is a break in the conductivity curve, dividing it into two temperature regions. At the high temperatures of 700° to 1100°C, the activation energy ( E a ) and oxygen partial pressure dependence of conductivity are found experimentally to be 1.4 to 1.5 eV and 1/ n = 1/5.4, and the possible defects and charge carriers are suggested to be metal vacancies and electron holes, respectively. At the lower temperatures of 400° to 600°C, the E a and 1/ n values obtained are 0.8 to 0.9 eV and 1/ n = 1/7.2 to 1/8.8, respectively. At the lower temperature, the NDT system seems to display a mixed conduction involving ionic conductivity due to diffusion of oxygen.
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