暗电流
光电探测器
响应度
金属有机气相外延
材料科学
光电子学
紫外线
化学气相沉积
蓝宝石
光电导性
分析化学(期刊)
物理
光学
化学
纳米技术
图层(电子)
激光器
有机化学
外延
作者
Xiaohu Hou,Haiding Sun,Shibing Long,Gary S. Tompa,T. Salagaj,Yuan Qin,Zhongfang Zhang,Pengju Tan,Shunjie Yu,Ming Liu
标识
DOI:10.1109/led.2019.2932140
摘要
α -phase-dominated Ga 2 O 3 films were heteroepitaxially grown on c-plane sapphire substrate by metalorganic chemical vapor deposition (MOCVD), followed by the fabrication of ultraviolet (UV) photodetectors (PDs) with a metal-semiconductor-metal (MSM) structure using a Ti/Au metal stack as the electrode in an interdigitated geometry. The PDs possess a record low dark current of 81 fA under a bias voltage of 12 V, with a high sensitivity as confirmed by a record high photo-to-dark-current ratio exceeding 107 under 254 nm light illumination. Furthermore, the PDs also exhibit a high responsivity and the photoconductive gain of 11.5 A/W and 55, respectively. Most importantly, it shows an ultrahigh detectivity of 1.0 × 10 15 Jones with a quite fast response of 42 ms, paving the way for advancement of next-generation PD applications.
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