记忆电阻器
纳米技术
材料科学
伤害感受器
神经形态工程学
纳米晶
计算机科学
工程类
化学
电子工程
人工智能
人工神经网络
生物化学
受体
伤害
作者
Ting Chen,Qian Ran,Yuchan Wang,Wenxia Zhang,Xiaosheng Tang,Yemei Han,Kailiang Zhang
标识
DOI:10.1021/acs.jpclett.4c01944
摘要
Halide perovskites (HPs) based memristors show great potential in the simulation of biological neurons. Herein, a memristor with Ag/PMMA&CsPbCl3/ITO structure is developed by incorporating CsPbCl3 nanocrystals (NCs) into poly(methyl methacrylate) (PMMA) as the functional layer. The device exhibits typical bipolar resistive behavior, low operating voltage, good endurance of more than 400 cycles, consistent and excellent ON/OFF ratio (≈ 103), and high mechanical bending stability (bending times = 1000). The RS mechanism has been well explained by the electric field induced formation and rupture of Ag filaments in the PMMA&CsPbCl3 layer. More importantly, the memristor successfully displays fundamental nociceptive functions including threshold, nonadaptation, relaxation, and sensitization (allodynia and hyperalgesia). To demonstrate the feasibility of the artificial nociceptor, a pressure nociceptor system is constructed using the Ag/PMMA&CsPbCl3/ITO device. These results provide new perspectives for the development of next-generation, high-performance HPs based neural morphology devices.
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