Preparation of 100GHz DWDM filter by high power medium frequency pulse magnetron sputtering

The development of optical communication makes CWDM technology unable to meet the design requirements, and the cost of 100GHz filter, a key optical device in DWDM technology, is high and the scale application is limited. In order to reduce the preparation cost of 100GHz filter and promote the development of DWDM technology, this study adopts high-power medium-frequency pulse magnetron sputtering technology for preparation, studies the sputtering power and analyzes the influence of oxygen and argon supply on sputtering of different sputtering materials. The thickness uniformity of the films is not less than 0.04%, and the sputtering rate is greater than 0.4nm/s. The design result is imported into the coating machine for automatic preparation. The insertion loss of the prepared product within the radius of 40mm is 0.1dB, the thickness difference of the film is less than 0.05%, and the preparation time is less than 30 hours. Finally, more than 2500 pieces of the finished filter can be obtained, and the output has been significantly improved, reaching the world's leading level.