化学
环境化学
电子顺磁共振
光解
光化学
核磁共振
物理
作者
Chenyan Hu,Li-Li Hu,Tian‐Yang Zhang,Xinyu Yang,Hao Liu,Jianan Chen,Ling-Mei Gao,Zheng-Yu Dong
标识
DOI:10.1080/09593330.2024.2432486
摘要
Recently, the emission of 222 nm Far-UVC krypton chloride (KrCl*) excimer lamps, has gained widespread attention in the field of water treatment. This study compared the degradation kinetics of IOX and ACE under UV222 and UV254 irradiation. The results demonstrated that UV222 irradiation exhibited higher efficiency, increasing the removal rates of IOX and ACE from 72.46% and 19.31% to 100%, respectively. Probe experiments and electron paramagnetic resonance (EPR) spectroscopy were used to identify the major active species generated during UV222 irradiation ([HO•]ss = 2.74 × 10-13 M). In addition, the effect of pH, pollutant concentration, anions, and natural organic matter (NOM) on the photolysis of IOX and ACE was investigated. The results indicated that IOX and ACE exhibited minimal dependence on pH, and IOX showed low sensitivity to water matrix components. Finally, the electrical energy consumption of the IOX and ACE photolysis by UV222 and UV254 irradiation was evaluated. The results revealed that UV222 irradiation demonstrated superior economic benefits (EE/OUV222/IOX = 0.59951 KWh/L, EE/OUV222/ACE = 0.25443 KWh/L), effectively reducing treatment costs. This study elucidated the photolysis characteristics of IOX and ACE under Far-UVC irradiation, providing a reference for the selection of process conditions in practical applications.
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