乙烯
臭氧
环境化学
化学
天体生物学
环境科学
有机化学
物理
催化作用
作者
Toshinori Miura,N. Kameda,Mitsuru Kekura,Hidehiko Nonaka,Ken Nakamura
标识
DOI:10.35848/1347-4065/adbeaa
摘要
Abstract For applying an alternative to resist removal, we analyzed and confirmed that electronically excited hydroxyl (OH) radical is produced from the reaction of highly concentrated ozone (O 3 ) gas with ethylene (C 2 H 4 ) gas for the resist removal processing at 10 2 Pa pressure. Fourier-transform infrared absorption spectroscopy revealed that the products of the initial part of the reaction are H 2 O, CO, CO 2 , an aldehyde, and an OH-containing species. Mass spectrometry confirmed the aldehyde to be formaldehyde (HCHO) as was reported. Ultraviolet-visible emission spectroscopy confirmed the OH-containing species to be electronically excited OH radical formed as an initial reaction intermediate, with its emission peak at 310 nm in the chemiluminescence emission spectrum. A second alkene molecule, isobutene ( i -C 4 H 8 ), was also found to produce the same OH species under the same experimental conditions, albeit at a lesser amount than that produced with C 2 H 4 . This oxidant can provide a novel resist removal method.
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