兴奋剂
掺杂剂
接受者
密度泛函理论
库仑
材料科学
空位缺陷
电子
载流子密度
凝聚态物理
航程(航空)
电子密度
化学物理
化学
计算化学
光电子学
物理
量子力学
复合材料
作者
Ji-Young Noh,Hanchul Kim,Yong‐Sung Kim,C. H. Park
摘要
We investigate the maximum available free electron carrier density in Al-doped n-type ZnO, based on density-functional theory calculations. The Coulomb interactions between the Al dopants and the Zn-vacancy native acceptors are found to limit the carrier density. In typical growth conditions, the n-type doping limit is found to be in the range of 1019 ∼ 1021 cm−3.
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