材料科学
卤化物
密度泛函理论
钙钛矿(结构)
离子
兴奋剂
扩散
半导体
光电子学
化学物理
带隙
纳米技术
计算化学
无机化学
结晶学
化学
物理
有机化学
热力学
作者
Bo Cai,Yangzhi Ma,Yang Bing,Yi Liu,Junmin Xia,Xi Chen,Zhi Li,Ming‐Gang Ju
标识
DOI:10.1002/adfm.202300445
摘要
Abstract Halide perovskites have attracted much attention because of their excellent optoelectronic properties, such as high light absorption, long carrier diffusion length, and high defect tolerance. Ion migration induced device performance degradation, which is not yet fully understood, has become the key obstacle for commercialization of halide perovskites. Here, a general mechanism is proposed, which can build up the connection between the ion migration barrier and the electronic density of states, to clarify the origin of low barrier for ion migration. Density functional theory (DFT) simulation results show that the low barrier is caused by a significant energy difference in band centers between Pb 2+ and the isolating halogen anion or by the small number of density of states. Following the explored mechanism, two strategies are proposed to boost barriers via DFT combination CI‐NEB simulations: 1) halide double perovskites and 2) B‐site doping. Furthermore, the finding not only deepens the understanding of ion migration in halide perovskites but also paves a new path for the commercialization of halide perovskite optoelectronic devices.
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