范德瓦尔斯力
伦敦分散部队
色散(光学)
材料科学
范德瓦尔斯半径
密度泛函理论
离子键合
哈梅克常数
从头算
范德瓦尔斯株
化学物理
统计物理学
物理
量子力学
分子
离子
作者
Sherif Abdulkader Tawfik,Tim Gould,Catherine Stampfl,Michael J. Ford
标识
DOI:10.1103/physrevmaterials.2.034005
摘要
In 2012, Bjorkman et al. posed the question "Are we van der Waals ready?" [J. Phys.: Condens. Matter, 2012, 24, 424218] about the ability of ab initio modelling to reproduce van der Waals (vdW) dispersion forces in layered materials. The answer at that time was no, however. Here we report on a new generation of vdW dispersion models and show that one, fractionally-ionic atom (FIA) theory, offers close to quantitative predictions for layered structures. Furthermore, it does so from a qualitatively correct picture of dispersion forces. Other methods, such as D3 and optB88vdW also work well, albeit with some exceptions. We thus argue that we are nearly vdW ready, and that some modern dispersion methods are accurate enough to be used for nanomaterial prediction, albeit with some caution required.
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