材料科学
异质结
光电子学
带隙
凝聚态物理
外延
分子束外延
电子能带结构
带偏移量
半导体
作者
Deependra Kumar Singh,Basanta Roul,Rohit Pant,Arun Malla Chowdhury,Karuna Kar Nanda,S. B. Krupanidhi
摘要
Heterojunction band offset parameters are critical for designing and fabricating junction-based devices as these parameters play a crucial role in determining the optical and electronic properties of a device. Herein, we report the band discontinuities at the MoS2/III-nitride (InN, GaN, and AlN) heterointerfaces. Few-layer MoS2 thin films are deposited by pulsed laser deposition on III-nitrides/c-sapphire substrates. Band offsets [valence band offset (VBO) and conduction band offset (CBO)] at the heterojunctions are determined by high-resolution x-ray photoelectron spectroscopy. The estimated band alignments are found to be type-I (VBO: 2.34 eV, CBO: 2.59 eV), type-II (VBO: 2.38 eV, CBO: 0.32 eV), and type-III (VBO: 2.23 eV, CBO: 2.87 eV) for MoS2/AlN, MoS2/GaN, and MoS2/InN, respectively. Such determination of the band offsets of 2D/3D heterojunctions paves a way to understand and design the futuristic photonic and electronic devices using these material systems.
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