单层
材料科学
低能电子显微镜
纳米电子学
纳米技术
蚀刻(微加工)
领域(数学分析)
电子显微镜
光电子学
结晶学
光学
图层(电子)
物理
化学
数学
数学分析
作者
Jianping Shi,Yang Yang,Yù Zhang,Donglin Ma,Wei Wei,Qingqing Ji,Yanshuo Zhang,Xiuju Song,Teng Gao,Cong Li,Xinhe Bao,Zhongfan Liu,Qiang Fu,Yanfeng Zhang,Qiang Fu,Yanfeng Zhang,Yanfeng Zhang
标识
DOI:10.1002/adfm.201403659
摘要
Controllable synthesis of large domain, high‐quality monolayer MoS 2 is the basic premise both for exploring some fundamental physical issues, and for engineering its applications in nanoelectronics, optoelectronics, etc. Herein, by introducing H 2 as carrier gas, the successful synthesis of large domain monolayer MoS 2 triangular flakes on Au foils, with the edge length approaching to 80 mm is reported. The growth process is proposed to be mediated by two competitive effects with H 2 acting as both a reduction promoter for efficient sulfurization of MoO 3 and an etching reagent of resulting MoS 2 flakes. By using low‐energy electron microscopy/diffraction, the crystal orientations and domain boundaries of MoS 2 flakes directly on Au foils for the first time are further identified. These on‐site and transfer‐free characterizations should shed light on the initial growth and the aggregation of MoS 2 on arbitrary substrates, further guiding the growth toward large domain flakes or monolayer films.
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