钝化
掺杂剂
有机场效应晶体管
材料科学
杂质
兴奋剂
场效应晶体管
富勒烯
晶体管
存水弯(水管)
光电子学
分析化学(期刊)
阈值电压
图层(电子)
电压
纳米技术
化学
有机化学
电气工程
工程类
环境工程
作者
Selina Olthof,Sanjeev Singh,Swagat K. Mohapatra,Stephen Barlow,Seth R. Marder,Bernard Kippelen,Antoine Kahn
摘要
We investigate trap-state passivation by addition of ultra-low amounts of n-dopants in organic field-effect transistors (OFET) made of as-received and purified fullerene C60. We find a strong dependence of the OFET threshold voltage (VT) on the density of traps present in the layer. In the case of the unpurified material, VT is reduced from 17.9 V to 4.7 V upon trap passivation by a dopant:C60 ratio of ∼10−3, while the Ion/off current ratio remains high. This suggests that ultra-low doping can be used to effectively compensate impurity and defect-related traps.
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