粘附
材料科学
原子力显微镜
表面粗糙度
表面光洁度
纳米技术
粒子(生态学)
接触力学
基质(水族馆)
复合材料
接触面积
显微镜
光学
热力学
有限元法
物理
地质学
海洋学
作者
L.H.G.J. Segeren,B. Siebum,F. G. Karssenberg,J.W.A. van den Berg,G. Julius Vancsó
标识
DOI:10.1163/156856102760136418
摘要
Abstract Atomic force microscopy (AFM) is one of the most flexible and simple techniques for probing surface interactions. This article reviews AFM studies on particle adhesion. Special attention is paid to the characterization of roughness and its effect on adhesion. This is of importance when comparing the measured adhesion forces to theoretical values, as the contact area is included in the contact mechanics theories. Even though adhesion models for time-independent adhesion are reasonably well developed, it remains difficult to connect the measured values to model predictions, especially because of the unknown value of the true contact area. The true area of contact depends on both the roughness of the probe as well as of the substrate. Our studies on the interactions between smooth silica particles, or rougher toner particles, and silicon substrates as a function of the surface roughness of the latter has shown the utility of AFM for measuring both roughness and particle adhesion. Keywords: particle adhesionpractical adhesionparticle attachmentroughnesstonerforce microscopy
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