Ar/SF 6 plasma simulation for dual-frequency capacitively coupled plasma incorporating gas flow simulation and secondary electron emission

Abstract We developed the coupled calculation of plasma and gas flows in simulations for dual-frequency excited Ar/SF 6 plasma. By focusing on the effect of secondary electron emission (SEE), we varied SEE coefficient γ and determined γ = 0.04 from the comparison of calculation results with the experimental results. The dependence of electron density on spatial distribution and SF 6 gas partial pressure was compared between calculation and experimental results. As a result, at SF 6 = 5.0 sccm, the calculated electron densities at the center and edge were almost the same as the experimental results. Furthermore, at SF 6 = 2.5 sccm, the error from the experiment including the spatial distribution was in the range of −11.03 to 4.11%, and the results of coupled calculation of plasma and gas flows in simulations can reproduce the experimental results under at a SF 6 partial pressure in the range from 2.5 to 5.0 sccm.