晶体管
材料科学
场效应晶体管
光电子学
相变
放大器
金属-绝缘体过渡
绝缘体(电)
二氧化二钒
静电感应晶体管
电压
电气工程
计算机科学
纳米技术
CMOS芯片
物理
凝聚态物理
金属
工程类
冶金
作者
Nikhil Shukla,Arun V. Thathachary,Ashish Agrawal,Hanjong Paik,Ahmedullah Aziz,Darrell G. Schlom,Sumeet Kumar Gupta,Roman Engel‐Herbert,Suman Datta
摘要
Collective interactions in functional materials can enable novel macroscopic properties like insulator-to-metal transitions. While implementing such materials into field-effect-transistor technology can potentially augment current state-of-the-art devices by providing unique routes to overcome their conventional limits, attempts to harness the insulator-to-metal transition for high-performance transistors have experienced little success. Here, we demonstrate a pathway for harnessing the abrupt resistivity transformation across the insulator-to-metal transition in vanadium dioxide (VO2), to design a hybrid-phase-transition field-effect transistor that exhibits gate controlled steep ('sub-kT/q') and reversible switching at room temperature. The transistor design, wherein VO2 is implemented in series with the field-effect transistor's source rather than into the channel, exploits negative differential resistance induced across the VO2 to create an internal amplifier that facilitates enhanced performance over a conventional field-effect transistor. Our approach enables low-voltage complementary n-type and p-type transistor operation as demonstrated here, and is applicable to other insulator-to-metal transition materials, offering tantalizing possibilities for energy-efficient logic and memory applications.
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