材料科学
制作
折射率
锑
光电子学
高折射率聚合物
光学
平版印刷术
电子束光刻
纳米光子学
纳米尺度
纳米结构
法布里-珀罗干涉仪
纳米技术
抵抗
纳米光刻
薄膜
基质(化学分析)
硫化物
菲涅耳透镜
聚合物
梁(结构)
作者
W. C. Wang,Uwe Hübner,Anne Gärtner,T. H. Chen,Joseph Köbel,Franka Jahn,Daniel Repp,Abhrodeep Dey,Henrik Schneidwind,Andrea Dellith,Jan Dellith,Torsten Wieduwilt,Matthias Zeisberger,Tanveer Ahmed Shaik,Astrid Bingel,M Schmidt,Jer‐Shing Huang,Ulf Peschel,Volker Deckert
标识
DOI:10.1002/adfm.202519065
摘要
ABSTRACT Fabricating high‐index materials with designed three‐dimensional (3D) micro optical elements is a challenging yet exciting area of research. Here, we develop an approach to 3D print high‐index nanostructures of antimony trisulfide (Sb 2 S 3 ) using grayscale electron beam lithography (g‐EBL). A key advantage of our approach is its simplicity compared to the conventional complex EBL‐based metalens fabrication process. The refractive index of Sb 2 S 3 films is precisely determined using a computational genetic algorithm and the transfer matrix method. The Sb 2 S 3 structures show high fidelity and reproducibility, with the refractive index being tunable through thermal treatment. We demonstrate the fabrication and performance of 3D Fresnel Zone Plates (FZPs) and metalenses with the same design specification. Theoretical and experimental evaluation confirmed the diffraction‐limited capability of as‐fabricated 3D optical elements and indicates that the focusing efficiency of FZPs is higher compared to metalenses. This work advances the application of Sb 2 S 3 in micro‐ and nanoscale photonics, highlighting its potential for dynamic optical devices with precise control over output properties.
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