哈夫尼亚
材料科学
纳米技术
工程物理
冶金
立方氧化锆
陶瓷
工程类
作者
Fuling Wu,Wenqi Sun,Shibing Xiao,Xiang Liu,Jia He,Xiaofang Liu,Huajun Sun
出处
期刊:Nanoscale
[The Royal Society of Chemistry]
日期:2025-01-01
卷期号:17 (37): 21792-21802
被引量:1
摘要
A new imprint mechanism in HfO 2 -based ferroelectrics—the oxygen vacancy segregation-charge trapping model—enables a novel method for its effective mitigation.
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