Interfacial engineering of transition metal dichalcogenide/carbon heterostructures for electrochemical energy applications

电化学 异质结 纳米技术 堆积 材料科学 化学 光电子学 物理化学 电极 有机化学
作者
Biao Chen,Simi Sui,Fang He,Chunnian He,Hui‐Ming Cheng,Shi‐Zhang Qiao,Wenbin Hu,Naiqin Zhao
出处
期刊:Chemical Society Reviews [The Royal Society of Chemistry]
卷期号:52 (22): 7802-7847 被引量:4
标识
DOI:10.1039/d3cs00445g
摘要

To support the global goal of carbon neutrality, numerous efforts have been devoted to the advancement of electrochemical energy conversion (EEC) and electrochemical energy storage (EES) technologies. For these technologies, transition metal dichalcogenide/carbon (TMDC/C) heterostructures have emerged as promising candidates for both electrode materials and electrocatalysts over the past decade, due to their complementary advantages. It is worth noting that interfacial properties play a crucial role in establishing the overall electrochemical characteristics of TMDC/C heterostructures. However, despite the significant scientific contribution in this area, a systematic understanding of TMDC/C heterostructures' interfacial engineering is currently lacking. This literature review aims to focus on three types of interfacial engineering, namely interfacial orientation engineering, interfacial stacking engineering, and interfacial doping engineering, of TMDC/C heterostructures for their potential applications in EES and EEC devices. To accomplish this goal, a combination of experimental and theoretical approaches was used to allow the analysis and summary of the fundamental electrochemical properties and preparation strategies of TMDC/C heterostructures. Moreover, this review highlights the design and utilization of the interfacial engineering of TMDC/C heterostructures for specific EES and EEC devices. Finally, the challenges and opportunities of using interfacial engineering of TMDC/C heterostructures in practical EES and EEC devices are outlined. We expect that this review will effectively guide readers in their understanding, design, and application of interfacial engineering of TMDC/C heterostructures.
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