MOSFET
材料科学
碳化硅
功率MOSFET
沟槽
光电子学
平面的
晶体管
功率半导体器件
场效应晶体管
半导体器件
辐照
电气工程
计算机科学
纳米技术
工程类
电压
物理
冶金
计算机图形学(图像)
图层(电子)
核物理学
作者
Lei Shu,Huailin Liao,Ziyuan Wu,Xingyu Fang,Shiwei Liang,Tongde Li,Liang Wang,Jun Wang,Yuanfu Zhao
出处
期刊:Electronics
[Multidisciplinary Digital Publishing Institute]
日期:2023-05-11
卷期号:12 (10): 2194-2194
被引量:7
标识
DOI:10.3390/electronics12102194
摘要
The switching characteristics of silicon carbide (SiC) metal-oxide-semiconductor field-effect transistor (MOSFET) power devices of different structures were experimented after exposure to a gamma irradiation environment. The experimental results for on-state were studied. The comparisons are shown for SiC MOSFET power devices with planar, trench and double trench structures tested for total ionizing dose (TID). A higher degradation of the switching characteristics was observed for the double trench structure. The physical mechanisms for these switching characteristics variations were analyzed. In addition, they were confirmed by technology computer-aided design (TCAD) simulation.
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