Highly efficient THz pulse generation in semiconductors utilizing contact-gratings technology
作者
Nelson M. Mbithi,Gergő Krizsán,Gyula Polónyi,Zoltán Tibai,János Hebling,J. A. Fülöp
出处
期刊:日期:2020-01-01卷期号:: JW1A.13-JW1A.13
标识
DOI:10.1364/euvxray.2020.jw1a.13
摘要
Simulations of contact grating design parameters in the wavelength range of 1.76-3.9 µm are presented for gallium arsenide and gallium phosphide. Diffraction efficiencies as high as 80% and 90% have been achieved in GaAs and GaP respectively.