Searching for lean production in semiconductors: New process introduction
作者
David C. Mowery,Nile W. Hatch,Michaël Borrus,Amy Shuen
出处
期刊:IEEE/CPMT International Electronics Manufacturing Technology Symposium日期:2002-12-30卷期号:: 490-500被引量:1
标识
DOI:10.1109/iemt.1993.398157
摘要
Some preliminary results of research on new process introduction in semiconductors are presented. Data and present descriptive data on trends in manufacturing improvement drawn from the authors' current sample are discussed. The qualitative evidence on interfirm differences in management and performance in new process introduction is reviewed. An exploratory empirical model of new process introduction and manufacturing improvement is presented. Results are summarized and some directions for further research are suggested.>