Catechol-thiol-based dental adhesive inspired by underwater mussel adhesion

The critical problem associated with the underwater mussel adhesive catechol-based 3,4-dihydroxy-L-phenylalanine (DOPA) is its sensitivity to oxidation. To overcome this problem, mussels underwent etching in the presence of acidic pH conditions (<3.0), and thiol chemistry was used to control the propensity of DOPA for oxidation. Similar strategies deployed by mussels are also actively utilized in dental adhesives which undergo etching in the presence of phosphoric acid derivatives to maximize the bonding strength and adapt thiol chemistries to minimize shrinkage stress. In view of the similarities between dental and underwater mussel adhesives, we employ in this study the strategy of mussel adhesion—the combination of DOPA and thiol chemistry with acid etching—to one of the most critical issues in dental adhesives, namely, the dentin bonding with zirconia. As a result, the adhesion bonding between zirconia and dentin, one of the most elusive problems in dentistry, has improved compared to the commercially available adhesive resin formulation. In addition, in view of the similar human oral and mussel adhesive environments, our findings will considerably contribute to the translation of the adhesive system inspired by mussels. Mussels are effectively operated by creating an acidic environment when adhering with 3,4-dihydroxy-l-phenylalanine (DOPA)–thiol redox chemistry for underwater bonding. Similarly, in dental adhesives, phosphoric acid-based etching is used for dentin-bonding materials. In view of the similarity between dental adhesives and underwater mussel adhesives, the combination of DOPA and thiol chemistry with acid etching can be used to overcome one of the most critical issues in dentin medical adhesives. The proposed adhesion method produces high adhesion strengths compared to those currently used in dentin and zirconia adhesives. Here, we extend and evaluate dentin and zirconia dental adhesives by mixing with mussel (DOPA)–thiol redox chemistry and acid etching.