Fabrication and Characterization of RF Magnetron Sputtered Silicon Oxide Films

In this work, silicon dioxide (SiO 2 ) films were fabricated on indium tin oxide (ITO) coated glass substrates by radio frequency (RF) magnetron sputtering deposition technique. The deposition rate of the magnetron sputtered SiO 2 films was investigated. The SiO 2 films were characterized with the atomic force microscopy (AFM) for their surface topology. In addition, the electrical insulating strength of the magnetron sputtered SiO 2 was examined.