The use of XPS valence band spectra in the study of plasma‐deposited polymeric films of tetramethyldisiloxane or hydroxyethylmethacrylate

Abstract Thin polymeric films were deposited from tetramethyldisiloxane (TMDSO) and hydroxyethylmethacrylate (HEMA) plasma. X‐ray photoelectron spectroscopy (XPS) and XPS valence band (XPS‐VB) analyses were performed to detect the effect of the deposition conditions on the structure of the plasma‐deposited films. In both cases XPS‐VB spectra were found strongly affected by the deposition conditions. Furthermore, XPS‐VB analysis can be used to obtain information on the structure and performances of these classes of plasma‐deposited polymer films.