扫描电子显微镜
薄膜
材料科学
钌
二氧化锡
兴奋剂
氧化锡
分析化学(期刊)
锡
化学工程
纳米技术
化学
复合材料
光电子学
冶金
有机化学
催化作用
工程类
作者
Cheriyedath Raj Sankar,V. Ponnuswamy,M. Manickam,R. Mariappan,R. Suresh
标识
DOI:10.1016/j.apsusc.2015.04.198
摘要
Tin oxide thin films doped with different concentrations of ruthenium were deposited on the glass substrates at 450 °C by nebulizer spray pyrolysis technique. The structural, morphological, thickness and optical properties of thin films were investigated by X-ray diffraction, scanning electron microscopy, stylus profilometer and ultra violet spectrometer techniques. X-ray diffraction pattern confirms the tetragonal crystal structure for pure and ruthenium doped tin dioxide thin films. Ruthenium doped tin dioxide thin films are polycrystalline in nature. Scanning electron microscopy shows the modification of surface morphology of tin dioxide films due to varying concentration of ruthenium. Largest spheres, rings and interconnected fibers are present in the scanning electron microscopy images. Energy dispersive analysis reveals the average atomic percentage of pure and ruthenium doped tin dioxide present in the films developed. Stylus profilometer was used to measure the film thickness. Pure, 5, 10 and 15 wt% ruthenium doped tin dioxide thin films are found to have 327, 349, 386 and 425 nm thickness. Optical studies divulge that the band gap energy decreases from 3.55 eV to 3.04 eV due to the increased ruthenium concentrations. Gas sensing properties of pure and ruthenium doped tin dioxide thin films have been studied for various gases.
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