分压
纳米晶材料
材料科学
氧气
镍
氧化镍
溅射沉积
氧化物
薄膜
溅射
冶金
分析化学(期刊)
纳米技术
化学
色谱法
有机化学
作者
A. Mallikarjuna Reddy,Y. Ashok Kumar Reddy,Ch. Seshendra Reddy,A. Sivasankar Reddy
出处
期刊:Springer proceedings in physics
日期:2013-01-01
卷期号:: 165-168
标识
DOI:10.1007/978-3-642-34216-5_17
摘要
Nickel oxide thin films have been successfully deposited by dc reactive magnetron sputtering technique on glass substrates at different oxygen partial pressures. X-ray diffraction analysis revealed that the preferred orientation changed from (200) to (220) with increasing oxygen partial pressure. Fine grains with RMS roughness of 9.4 nm were observed at an oxygen partial pressure of 6 × 10−4 mbar.
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