发光二极管
光电子学
材料科学
紫外线
传输(电信)
宽禁带半导体
蚀刻(微加工)
电气工程
纳米技术
工程类
图层(电子)
作者
Y.L. Yang,Yuqi Hou,Feng Wu,Zhihua Zheng,Shizhou Tan,Dan‐Xia Xu,Linlin Xu,Chao Shen,Nan Chi,Jiangnan Dai,Changqing Chen
标识
DOI:10.1109/ted.2024.3378218
摘要
AlGaN deep ultraviolet light-emitting diodes (DUV LEDs) have potential applications in free-space communication, but their current limited efficiency restricts the further development of free-space ultraviolet communication (FSUC) applications. In this work, an etched reflective array (ERA) strategy has been proposed in DUV micro-LEDs with various pixel sizes of 20, 30, and 60 $\mu $ m, to enhance the efficiency via etching the p-GaN layer to reduce light absorption and fabricating full-spatial omnidirectional reflector (FSODR) to increase light extraction. The 20- $\mu $ m DUV micro-LEDs with ERA strategy exhibit a light output power (LOP) of 39.9 mW at 160 mA and a record high wall-plug efficiency (WPE) of 8.3% at 5 mA. Critically, both the transverse-magnetic (TM) and transverse-electric (TE) mode light intensity are significantly enhanced by 52.59% and 46.29%, respectively, compared with the device without ERA strategy. Furthermore, simulation results show that the light extraction efficiency (LEE) of TM-and TE-polarized light for the 20- $\mu $ m DUV micro-LEDs with ERA strategy are enhanced by 48.66% and 46.05%, respectively. In addition, this device achieves a high data transmission rate of 3.819 Gbps in FSUC.
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