Optimum design for a two-stage CMOS I/O ESD protection circuit
作者
Tong Li,P. Bendix,D. Suh,Yunsung Huh,Elyse Rosenbaum,Ashish Kapoor,Sung‐Mo Kang
标识
DOI:10.1109/iscas.1998.706854
摘要
In industry, the design of CMOS ESD (electrostatic discharge) protection devices and circuits has been approached empirically. In this work, we propose an optimization methodology for a typical two-stage CMOS I/O protection circuit based on simulation. We have identified two kinds of design, namely resistor-limited and NMOS-limited, and demonstrated that the isolation resistor design is the key to the circuit's protection level and performance.