Preparation and characterization of electrospun nanofibers-based facial mask containing hyaluronic acid as a moisturizing component and huangshui polysaccharide as an antioxidant component

A novel nanofiber material incorporating hyaluronic acid (HA), crude huangshui polysaccharide (cHSP) and polyvinyl alcohol (PVA) were prepared to obtain dry facial masks (PVA/HA/cHSP) via electrospinning. The facial mask was characterized by scanning electron microscopy (SEM), water absorption and retention evaluation, in vitro release study, DPPH and hydroxyl free radical scavenging measurements, red blood cell hemolysis and chick embryo chorioallantoic membrane assay. The results suggested that the fiber mask was densely homogeneous, uniform and well distributed with a diameter <260 nm. Meanwhile, the water absorption rate was >300 %, DPPH and hydroxyl free radical half-inhibitory concentrations of cHSP aqueous solution scavenging were 0.2781 and 1.029 mg/mL, respectively. The PVA/HA/cHSP could retain the antioxidant capacity of cHSP, possessing simultaneous excellent moisture retention and oxidation resistance. Importantly, the mucous membrane irritation experiment indicated that it was mild and safe.