材料科学
薄膜晶体管
溶解过程
晶体管
阈值电压
氧化物薄膜晶体管
光电子学
饱和(图论)
铟
电压
纳米技术
电气工程
图层(电子)
数学
组合数学
工程类
作者
Sang Yeol Lee,Taehyun Kang,Sang Min Han,Young Seon Lee,Jun Young Choi
标识
DOI:10.4313/teem.2015.16.1.46
摘要
Thin film transistor (TFT) with silicon indium zinc oxide (SIZO) was fabricated by solution process, and the effect of annealling temperature on the electrical performance has been explored. The performance of SIZO TFT exhibited saturation mobility of $1.37cm^2$/Vs, a threshold voltage of -7.2 V, and an on-off ratio of $1.1{\times}10^5$.
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