Indium Gallium Zinc Oxide FinFET Compared with Silicon FinFET

Indium gallium zinc oxide fin-field effect transistor (IGZO FinFET) characteristics are investigated and then compared with Zinc oxide fin-field effect transistor (ZnO FinFET) and the Silicon fin-field effect transistor (Si FinFET). This was done using 3D simulation. The threshold voltage for Si, ZnO, and IGZO is 0.75 V, 0.30 V and 0.05 V respectively. The silicon device has the highest transconductance (5.0 x 10 -7 S) and performs better than the other devices because it has less fixed charge defects. IGZO has the second-best value of Gm (3.6 x 10 -7 S), ZnO has the least value of Gm (3.4 x 10 -7 S). Si device has the least drain current (I DS ) value of 2.0 x 10 -7 A, ZnO device has a better I DS value of 6.2 x 10 -6 A while IGZO device has the best I DS value of 1.6 x 10 -5 A. IGZO is better than Si by two (2) order magnitude. The field effect mobility is 50.0 cm 2 /Vs for all three devices.